1.1 特性
- 8英寸硅基氮化镓技术
- 工业应用
- 极低栅极电荷
- 超低导通电阻
- 占板面积非常小
150V增强型GaN功率晶体管
基于先进的GaN技术的150V硅基氮化镓增强型高电子迁移率晶体管,采用FCQFN 4mmX6mm 封装。
Platform (S150E2.0I) | ||||
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Product (INN150FQ032A) | ||||
Test Items | Test Conditions | Sample Size (Unit x Lot) | #Fail | Result |
MSL3 | T=30°C, RH=60%, 3 x reflow, 192hrs | 25 x 3 | 0 Fail | Pass |
HTRB | T=150°C, VD=150V, 1000hrs | 77 x 3 | 0 Fail | Pass |
HTGB | T=150°C, VG=5.5V, 1000hrs | 77 x 3 | 0 Fail | Pass |
HTS | T=150°C | 77 x 3 | 0 Fail | Pass |
TC | -55 to +150°C, Air, 1000Cys. | 77 x 3 | 0 Fail | Pass |
H3TRB | T=85°C, RH=85%, VD=120V, 1000hrs | 77 x 3 | 0 Fail | Pass |
HAST | T=130°C, RH=85%, VD=42V, 96hrs | 77 x 3 | 0 Fail | Pass |
DHTOL | Tc=125℃, Vin=120V, Vout=36V, Iout=2.8A, fsw=200KHz | 8 x 3 | 0 Fail | Pass |
HBM | All Pins | 3 x 1 | 0 Fail | Class 1C |
CDM | All Pins | 3 x 1 | 0 Fail | Class C3 |